| 摘要 |
<p>PROBLEM TO BE SOLVED: To reproduce a high aspect ratio absorber pattern with good reproducibility over a large exposure area by fixing the absorber to a transmit ting material composed of resin. SOLUTION: An absorber pattern 3 is fixed on a transmitting film 2 composed of a polyimide resin. The polyimide resin layer is, for example, a 3μm thickness film which flatly adheres to a supporting frame 4 composed of a strong metal by applying tensile force. Since the film is being pulled, the thermal expansion coefficient of the X-ray mask 1 is decided by the material of the supporting frame 4. In this example, the width of the bottom part is 5μm, the space is 10μm and the thickness is 15μm. The thickness of the polyimide resin 2 is 3-5μm, and the Au absorber pattern is adhered with an organic agent. Since the thickness of the polyimide resin 2, which is the transmitting material, is 3μm, while that of the Au absorber pattern 3 is 15μm, sufficient mask contrast can be obtained for exposure with an X-ray wavelength of approximately 0.2-0.8 nm. With this structure, an X-ray mask 1 having a large exposure area with a diameter of 300 mm is obtained.</p> |
