| 摘要 |
PROBLEM TO BE SOLVED: To provide a partitioning wall pattern whose sectional shape is trapezoidal and whose upper end width is narrow to improve an opening ratio by using photosensitive paste composed of inorganic fine particle and photosensitive organic component, bringing a distance between a photomask and the surface of photosensitive paste applied film into a specified range, and then performing exposure. SOLUTION: Photosentive paste which contains 70-95 wt.% of inorganic fine particles composed of glass fine particles having the index of refraction of 1.5-1.65 is applied as a surface flat photosensitive coating film whose film thickness is 200-240μm onto a glass substrate by using a doctor blade or slit die coater. By the use of a photosensitive monomer such as an acrylate or methacrylate monomer having a high photosensitive characteristic-the index of refraction is 1.55-1.8, the index of refraction thereof is made to close to that of glass fine particles. Exposure is carried out with the distance between a photomask and a paste application surface made not more than 5μm to thereby obtain a high aspect pattern (pitch: 100-250μm, line width: 15-50μm, height: 50-170μm).
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