SEMICONDUCTOR DEVICE HAVING FUSE AND FABRICATION METHOD THEREOF,申请号WO1998JP04581-传众专利搜索

发明名称	SEMICONDUCTOR DEVICE HAVING FUSE AND FABRICATION METHOD THEREOF
摘要	<p>A semiconductor device comprising a fuse and an etching stopper film covering the fuse wherein an optical window for exposing the etching stopper film and a contact hole for exposing a conductor pattern are formed simultaneously, and an insulation film covering the fuse is exposed from the optical window by dry etching the etching stopper film.</p>
申请公布号	WO9919905(A1)	申请公布日期	1999.04.22
申请号	WO1998JP04581	申请日期	1998.10.12
申请人	FUJITSU LIMITED;SUZUKI, SEIICHI;ADACHI, KAZUHIRO;KATAYAMA, MASAYA;SUZUKI, NORIYUKI;HIDESHIMA, OSAMU;KAWABATA, KENICHI;OHTSUKI, MASAYA;HAYASHI, MANABU;YAYANAGI, JUNICHI	发明人	SUZUKI, SEIICHI;ADACHI, KAZUHIRO;KATAYAMA, MASAYA;SUZUKI, NORIYUKI;HIDESHIMA, OSAMU;KAWABATA, KENICHI;OHTSUKI, MASAYA;HAYASHI, MANABU;YAYANAGI, JUNICHI
分类号	H01L21/768;H01L21/8239;H01L21/8242;H01L23/525;(IPC1-7):H01L21/82;H01L27/108;H01L27/04;H01L21/824;H01L21/822	主分类号	H01L21/768
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