METHOD AND APPARATUS TO PRODUCE LARGE INDUCTIVE PLASMA FOR PLASMA PROCESSING

摘要

The apparatus (12) generates a time-varying magnetic field through a field admission window (22) of plasma processing chamber (10) to create or sustain a plasma within the chamber by inductive coupling. It comprises: a magnetic core (26; 260) presenting a unipolar pole face structure (26a; 260a) adapted to be applied against or in proximity to the window and having an active field emission area whose size and shape substantially matches the field admission window, and an inductor means (28) associated with the magnetic core, for generating a substantially uniformly distributed time-varying magnetic field throughout the unipolar pole face structure. The apparatus can be formed as an integral part of a plasma processing chamber. The invention also relates to a plasma processing chamber having more than one field admission window for cooperating e.g. with respective time-varying magnetic field generating apparatus.