发明名称 |
Water-soluble photoresist composition |
摘要 |
<p>A water-soluble photoresist composition is provided which comprises a water-soluble photosensitive composition containing casein and a water-soluble photosensitive agent and at least one kind of calcium salt of organic acid. The composition has excellent sensitivity, resolution, and etching resistance and can be used for the production of highly refined electronic components such as shadow masks, lead frame, etc.</p> |
申请公布号 |
EP0909992(A1) |
申请公布日期 |
1999.04.21 |
申请号 |
EP19980111609 |
申请日期 |
1998.06.24 |
申请人 |
FUJI CHEMICALS INDUSTRIAL CO., LTD. |
发明人 |
UMEHARA, HIROSHI;ASANO, TAKATERU |
分类号 |
G03F7/004;C08K5/098;C08L89/00;C23F1/00;G02B5/20;G03F7/04;H01J9/14;(IPC1-7):G03F7/04;G03C1/66 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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