发明名称 Single phase tungsten-titanium sputter targets and method of producing same
摘要 A single phase W-Ti sputter target and a method of manufacturing the target are disclosed. The target is produced by mixing powders of tungsten and titanium and subjecting the mixed powders to a pressing operation for a time, temperature and pressure sufficient to achieve a mutual solid solution of W and Ti, forming single beta (Ti,W) phase. The single phase sputtering target emits much less particulate during sputtering than conventional multiphase W-Ti targets of comparable density and composition.
申请公布号 US5896553(A) 申请公布日期 1999.04.20
申请号 US19960630155 申请日期 1996.04.10
申请人 SONY CORPORATION;MATERIALS RESEARCH CORPORATION 发明人 LO, CHI-FUNG
分类号 C22C1/04;C22C27/04;C23C14/34;(IPC1-7):B22F3/12 主分类号 C22C1/04
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