发明名称 Semiconductor device
摘要 A barrier layer (AlAs) is formed on a source layer (n-GaAs), and a drain layer (n-GaAs) and a gate layer (p-GaAs) adjacent to the drain layer are formed on the barrier layer. If the drain layer is biased to a plus voltage with the source layer, then a tunneling current will flow by way of the barrier layer. By applying a voltage to the gate layer so that the p-n junction is biased in the reverse direction, the potential on the gate side of the channel rises and the tunneling current decreases. Also, the channel width decreases due to the spread of the depletion layer to the channel side, and consequently, the current of the drain layer decreases. Thus, based on the voltage applied to the gate layer, the drain current can be controlled.
申请公布号 US5895931(A) 申请公布日期 1999.04.20
申请号 US19970861886 申请日期 1997.05.22
申请人 HONDA GIKEN KOGYO KABUSHIKI KAISHA 发明人 SAKURAI, NOBUHIRO
分类号 H01L29/68;H01L29/205;H01L29/772;H01L29/80;H01L29/808;(IPC1-7):H01L29/06;H01L31/032;H01L31/033;H01L31/072 主分类号 H01L29/68
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