发明名称 |
Fused silica lens, microlithography system including a fused silica lens and method of making a fused silica lens |
摘要 |
A method of producing a fused silica glass by thermally converting a polymethylsiloxane precursor, the lens transmitting ultraviolet radiation at wavelengths below 300 nm. without undergoing a marked absorption transition, the lens so produced, and a microlithography system employing a lens of such glass.
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申请公布号 |
US5896222(A) |
申请公布日期 |
1999.04.20 |
申请号 |
US19970985552 |
申请日期 |
1997.12.05 |
申请人 |
CORNING INCORPORATED |
发明人 |
ROSPLOCK, CYNTHIA K.;SEMPOLINSKI, DANIEL R. |
分类号 |
G02B1/04;C03B19/14;C03C3/06;C03C4/00;(IPC1-7):G02B13/14;C03B19/09 |
主分类号 |
G02B1/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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