| 摘要 |
The process starts with the three classic phases, namely a first phase to form an anodic film, a second phase to modify the barrier film and a third phase to deposit metallic particles on the barrier film, its characteristics lying in that in the first phase, namely formation of the anodic film, a thickness in excess of 0.3 mu m is established, that the second phase, namely the electrolytic modification of the barrier film, is carried out in a low dissolving power electrolyte, applying a low voltage and a low current density, and that the third phase is carried out by a slight electrolytic deposition of metallic particles in order to increase internal reflections under the said deposit. In particular, the average voltage applied in the electrolytic modification of the barrier film is below 5 volts of a complex alternating current, and the average density of the current applied is less than 200 mA/dm<2> of the said complex alternating current. |
