PROJECTION EXPOSURE METHOD AND APPARATUS

摘要

A projection exposure apparatus comprising a projection optical system adapted to project a pattern of a mask onto a photosensitive base plate, parallel planar plates disposed on the side of the photosensitive base plate of the projection optical system so that the parallel planar plates extend at substantially right angles to the optical axis of the projection optical system, and a regulator adapted to regulate at least one of an angle of inclination of normal of the parallel planar plates with respect to the optical axis of the projection optical system and a direction in which the parallel planar plates are inclined.