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发明名称
FORMING METHOD OF CONTACT HOLE IN SEMICONDUCTOR DEVICE
摘要
申请公布号
KR0176199(B1)
申请公布日期
1999.04.15
申请号
KR19960007378
申请日期
1996.03.19
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
SHIM, MYUNG-SUB;SHIN, HYUN-CHUL;OH, KYUNG-SUK
分类号
H01L21/28;H01L21/768;(IPC1-7):H01L21/28
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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