| 发明名称 |
Process for reducing shrinkage of features formed in a photoresist by treatment with an amine, an amide or an aldehyde |
| 摘要 |
<p>A process for reducing shrinkage of photolithographic features formed in a photoresist including exposing the photoresist to at least one material selected from the group consisting of at least one amine, at least one amide, at least one aldehyde, and nitrogen. <IMAGE></p> |
| 申请公布号 |
EP0908786(A2) |
申请公布日期 |
1999.04.14 |
| 申请号 |
EP19980308051 |
申请日期 |
1998.10.02 |
| 申请人 |
AXCELIS TECHNOLOGIES, INC. |
发明人 |
MOHONDRO, ROBERT D. |
| 分类号 |
G03F7/039;G03F7/004;G03F7/40;H01L21/027;(IPC1-7):G03F7/40 |
主分类号 |
G03F7/039 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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