| 摘要 |
PROBLEM TO BE SOLVED: To decompose and remove defect causing materials sticking to a mask and to always ensure clean mask quality as well as to prevent the occurrence of defects on the mask during storage. SOLUTION: A wall 2 made of a photocatalytic material and an illumination light source 3 capable of exciting photocatalytic reaction are disposed in a housing vessel 1 for housing a mask 4. When the wall 2 is irradiated with UV from the light source 3, excited active oxygen radicals etc., are generated from the surface of the wall 2 and photocatalytic reaction accompanied by strong oxidation-reduction action is caused. By the reaction, gaseous impurities etc., existing in atmospheric gas 5, are converted into harmless inorg. ions after decomposition, e.g. into gaseous CO2 and H2 . Defect causing materials do not stick to the mask 4 and the occurrence of defects on the mask 4 can be prevented. |
