发明名称 WAFER-SUPPORTING TURN TABLE
摘要 <p>PROBLEM TO BE SOLVED: To avoid floating of a wafer from a table during rotation to easily and surely support the wafer by providing a presser for pressing the top face of the wafer toward the table with rotation of the table by a rotary mechanism. SOLUTION: As treating of a wafer W begins, a drive motor rotates the wafer-supporting turntable 30a mounting a wafer at a high speed with a pendulum 33b shifting in a direction a due to a centrifugal force. A pressing claw 33c of a presser 33 attached to the table 30a swings to press the top face of the wafer W to the table 30a enough to avoid floating the wafer or deviating its position, thus easily and surely supporting the wafer W with the table 30a.</p>
申请公布号 JPH1197515(A) 申请公布日期 1999.04.09
申请号 JP19970257357 申请日期 1997.09.22
申请人 TOSHIBA CORP 发明人 TERAI FUJIO
分类号 H01L21/683;H01L21/205;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/683
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