发明名称 METHOD FOR IDENTIFYING CONTAMINATION SOURCE
摘要 <p>PROBLEM TO BE SOLVED: To identify a contamination source by checking an isotope ratio at a contaminated part when a semiconductor device is polluted, by specifying a plurality of parts of a device for manufacturing of treating a semiconductor device and by forming the specified parts of materials whose isotope ratios are different from each other. SOLUTION: Since an isotope is identified by mass spectrometric analysis, an isotope ratio or isotope concentration different from a natural isotope ratio can be detected by the mass spectrometric analysis, but there is no difference in chemical action between them. Therefore, there is no mechanical problem in using material, whose isotope ratio is different from the natural isotope ratio, as material for forming the device. Accordingly, if a part thought to be apt to become a contamination source is previously selected in the device and the part is made of the material whose isotope ratio is different from the natural isotope ratio, in the case where a product is contaminated, the contamination source is identified by checking the isotope ratio of a contamination element.</p>
申请公布号 JPH1197321(A) 申请公布日期 1999.04.09
申请号 JP19970253919 申请日期 1997.09.18
申请人 TOSHIBA CORP 发明人 KOZUKA SHOJI;TOMITA MITSUHIRO;YAMADA YUJI;TAKENAKA MIYUKI;MATSUNAGA HIDEKI
分类号 G01N23/225;H01L21/02;H01L21/205;(IPC1-7):H01L21/02 主分类号 G01N23/225
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