| 摘要 |
PROBLEM TO BE SOLVED: To prevent the dropping, etc., of a treating solution onto a substrate after the supply of the treating solution is stopped by stably supplying the treating solution to the substrate without allowing the mixture of bubbles in the solution. SOLUTION: A developer supplying mechanism 2 which supplies a developer Q to the upper surface of a substrate held in a horizontal attitude is provided with a solution supplying pipe 21 through which the developer Q is supplied to the substrate and a nozzle main body section 22 connected to the front end section of the pipe 21. The main body section 22 is provided with an inverting section 24 which changes the flowing direction of the developer Q supplied downward to the main body section 22 from the front end section of the pipe 21 to an upward direction, a first flow passage section 25 including the inverting section 24, and second flow passage sections 27 one ends of which communicate with and connected to the upper section of the first flow passage section 25 and the other ends of which have discharge ports 26 for discharging the developer Q from the main body section 22 and which leads the developer Q in the first flow passage section 25 to the discharge ports 26 by changing the flowing direction of the developer Q to downward directions from the upward directions. |
