| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask which is used in a photolithography stage at the time of producing a semiconductor device or liquid crystal display device and substantially prevents the failure of the ends of the mask even if these masks receive impact. SOLUTION: Protective members 2 consisting of elastic materials are mounted at the angle parts at the four corners of the mask 1. The protective members 2 are so mounted at these parts that the recessed parts formed to profile the angular part shapes of the mask 1 are fitted onto the angle parts of the mask 1. The inside width TB of the protective members 2 is formed slightly narrower than the thickness TM of the glass substrate of the mask 1 so as not to be easily dislodged. The outside surfaces of the protective members 2 are formed to the shape nearly profiling the angle part shape of the mask 1. The outside surfaces of the protective members 2 have the prescribed height from the flanks of the glass substrate. Even if the mask 1 deviates and its angle parts collide against other members, the impact is absorbed by the protective members 2 and the failure of the mask 1 is averted. |
