发明名称 METAL GATE FERMI-THRESHOLD FIELD EFFECT TRANSISTORS
摘要 A Fermi-threshold field effect transistor includes a metal gate (28') rather than a contra-doped polysilicon gate. The metal gate can lower the threshold voltage of the Fermi-FET without degrading other desirable characteristics of the Fermi-FET. The metal gate may be a pure metal gate or a metal alloy gate such as a metal silicide gate. The metal gate preferably includes metal having a work function between that of P-type polysilicon and N-type polysilicon.
申请公布号 WO9917371(A1) 申请公布日期 1999.04.08
申请号 WO1998US19761 申请日期 1998.09.22
申请人 THUNDERBIRD TECHNOLOGIES, INC. 发明人 DENNEN, MICHAEL, W.;RICHARDS, WILLIAM, R., JR.
分类号 H01L29/49;H01L29/78 主分类号 H01L29/49
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