发明名称 Silicon-on-insulator field effect transistor e.g. for VLSI technology and memory
摘要 The silicon-on-insulator field effect transistor has a gate on an insulating layer (10) with associated source and drain zones of one conductor type on an insulator (2) and a semiconducting zone or body (7,8) of the other conductor type between the source and drain zones. A trench (9) in the semiconducting zone of the other conducting type is filled with the gate-electrode material (11) which is capacitively or directly coupled to the semiconducting zone of the other conductor type.
申请公布号 DE19741363(A1) 申请公布日期 1999.04.08
申请号 DE19971041363 申请日期 1997.09.19
申请人 SIEMENS AG, 80333 MUENCHEN, DE 发明人 TIHANYI, JENOE, DR.-ING., 85551 KIRCHHEIM, DE
分类号 H01L29/786;(IPC1-7):H01L29/78;H01L27/12 主分类号 H01L29/786
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