发明名称 |
Silicon-on-insulator field effect transistor e.g. for VLSI technology and memory |
摘要 |
The silicon-on-insulator field effect transistor has a gate on an insulating layer (10) with associated source and drain zones of one conductor type on an insulator (2) and a semiconducting zone or body (7,8) of the other conductor type between the source and drain zones. A trench (9) in the semiconducting zone of the other conducting type is filled with the gate-electrode material (11) which is capacitively or directly coupled to the semiconducting zone of the other conductor type.
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申请公布号 |
DE19741363(A1) |
申请公布日期 |
1999.04.08 |
申请号 |
DE19971041363 |
申请日期 |
1997.09.19 |
申请人 |
SIEMENS AG, 80333 MUENCHEN, DE |
发明人 |
TIHANYI, JENOE, DR.-ING., 85551 KIRCHHEIM, DE |
分类号 |
H01L29/786;(IPC1-7):H01L29/78;H01L27/12 |
主分类号 |
H01L29/786 |
代理机构 |
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