发明名称 Enhanced vacuum arc vapor deposition electrode
摘要 A process for forming a thin metal coating on a substrate wherein a gas stream heated by an electrical current impinges on a metallic target in a vacuum chamber to form a molten pool of the metal and then vaporize a portion of the pool, with the source of the heated gas stream being on one side of the target and the substrate being on the other side of the target such that most of the metallic vapor from the target is directed at the substrate.
申请公布号 US5891312(A) 申请公布日期 1999.04.06
申请号 US19960772541 申请日期 1996.12.24
申请人 THE UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF THE NATIONAL AERONAUTICS AND SPACE ADMINISTRATION 发明人 WEEKS, JACK L.;TODD, DOUGLAS M.
分类号 C23C14/32;H01J37/32;H05H1/48;(IPC1-7):C23C14/00 主分类号 C23C14/32
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