发明名称 POLISHING PAD
摘要 PROBLEM TO BE SOLVED: To resolve clogging with simple dressing only by setting the hardness of the surface of a polishing pad to a specific value. SOLUTION: A nonwoven fabric forming a polishing pad is not limited in particular as long as it is made of fibers, and the hardness (JIS K6301 A type) of the surface of the obtained polishing pad is set to 85 deg.-99 deg., preferably 88 deg.-98 deg., to increase the flatness required for a CMP polishing pad. The nonwoven fabric is made of thermal fusion fibers and thermal nonfusion fibers. The ratio between the thermal fusion fibers and the thermal nonfusion fibers is preferably set to 10-50 wt.%: 50-90 wt.%. When the ratio of the thermal fusion fibers is below 10 wt.%, the hardness of the obtained polishing pad becomes insufficient after a heat treatment is applied later. When the ratio of the thermal fusion fibers is larger than 50 wt.%, fusion proceeds too much at the time of the heat treatment, and the permeability of a polishing slurry is deteriorated.
申请公布号 JPH1190809(A) 申请公布日期 1999.04.06
申请号 JP19970246709 申请日期 1997.09.11
申请人 TEIJIN LTD 发明人 ENOMORI MASATSUGU;NISHIHARA TOSHIO;ARAKI TADAAKI
分类号 B24B37/20;B24B37/24;D04H1/541 主分类号 B24B37/20
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