| 摘要 |
PROBLEM TO BE SOLVED: To obtain the subject thin film of high crystallinity with high adhesiveness in high film formation speed, without scattering broken microparticles during vacuum film formation process and/or change in film formation speed with the lapse of time, by incorporating a MgO sintered compact with Y2 O3 and Al2 O3 . SOLUTION: This MgO sintered compact is obtained by vacuum deposition, through vacuum film formation process at a rate of 180 Å/s, of a composition comprising 100 pts.wt. of MgO, 0.05-2.0 pts.wt. of Y2 O3 , and 0.025-1.0 pt.wt. of Al2 O3 , followed by grinding the resultant sintered compact so as to be <=10 μm in average particle size and <=100 μm in all of the particle size and then molding and sintering again. The other objective MgO thin film is obtained by further vacuum deposition of the above MgO sintered compact pref. at a rate of film formation of 180 Å/s and at a substrate temperature of <=300 deg.C; this thin film has crystal structure oriented to (111) and (222). Furthermore, a MgO sintered compact laminate wherein an Al2 O3 , layer is laminated between the MgO thin film and the substrate can also be obtained. |
