| 发明名称 |
PHOTO-MASK USED IN ALIGNER FOR EXACTLY TRANSFERRING MAIN PATTERN ASSISTED BY SEMI-TRANSPARENT AUXILIARY PATTERN |
| 摘要 |
A photo-mask has a main pattern implemented by a photo-shield strip and an auxiliary pattern implemented by semi-transparent strips, and the photo-shield strip is equal in width to the semi-transparent strips so as to allow the photo-shield strip to be close to the resolution limit without destroy of the effects of the auxiliary pattern. |
| 申请公布号 |
KR0186657(B1) |
申请公布日期 |
1999.04.01 |
| 申请号 |
KR19960025340 |
申请日期 |
1996.06.28 |
| 申请人 |
NEC CORP. |
发明人 |
HASHIMOTO, SHUICHI;KASAMA, KUNIHIKO |
| 分类号 |
G03F1/00;G03F1/36 |
主分类号 |
G03F1/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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