METHOD FOR MANUFACTURING A CONTACT HOLE IN A SEMICONDUCTOR DEVICE,申请号KR19950023876-传众专利搜索

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发明名称	METHOD FOR MANUFACTURING A CONTACT HOLE IN A SEMICONDUCTOR DEVICE
摘要
申请公布号	KR0175414(B1)	申请公布日期	1999.04.01
申请号	KR19950023876	申请日期	1995.08.02
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人
分类号	H01L21/28;(IPC1-7):H01L21/28	主分类号	H01L21/28
代理机构		代理人
主权项
地址

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