发明名称 Verfahren und Einrichtung zum Beizen eines Metallbandes
摘要 The invention relates to a method and device for etching a metal strip (2), especially a rolling strip, by means of an etching facility (1) through which the metal strip (2) passes and in which the metal strip (2) is etched by means of a caustic agent, whereby the etching result is dependent upon etching parameters (TZ,TA,v,cS,CFe,B,p). The etching result is measured and at least one etching parameter (TZ,TA,v,cS,cFe,B,p) is automatically modified according to the measurement of the etching result in order to improve etching performance.
申请公布号 DE19743022(A1) 申请公布日期 1999.04.01
申请号 DE19971043022 申请日期 1997.09.29
申请人 SIEMENS AG, 80333 MUENCHEN, DE 发明人 SCHLECHTER, WILFRIED, DIPL.-ING., 91315 HOECHSTADT, DE
分类号 C23F1/00;C23G3/02;(IPC1-7):C23G1/00;C23G5/02 主分类号 C23F1/00
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