摘要 |
The invention relates to a method and device for etching a metal strip (2), especially a rolling strip, by means of an etching facility (1) through which the metal strip (2) passes and in which the metal strip (2) is etched by means of a caustic agent, whereby the etching result is dependent upon etching parameters (TZ,TA,v,cS,CFe,B,p). The etching result is measured and at least one etching parameter (TZ,TA,v,cS,cFe,B,p) is automatically modified according to the measurement of the etching result in order to improve etching performance.
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申请人 |
SIEMENS AG, 80333 MUENCHEN, DE |
发明人 |
SCHLECHTER, WILFRIED, DIPL.-ING., 91315 HOECHSTADT, DE |