发明名称 OPTICAL LITHOGRAPHY BEYOND CONVENTIONAL RESOLUTION LIMITS
摘要 <p>Optical lithography scheme making use light coupling structures, and elastomeric light coupling structures in particular. These light coupling structures comprise protruding portions and connecting portions. The protruding elements are designed to be brought into conformal contact with a resist to be exposed such that the light guided into the protruding elements is coupled from there directly into the resist. The lateral shape and size of the protruding elements defines 1:1 the lateral size and shape of small features to be exposed in a resist.</p>
申请公布号 WO1999015933(A1) 申请公布日期 1999.04.01
申请号 IB1997001124 申请日期 1997.09.19
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址