发明名称 Semiconductor component with separating structure for high HV strength
摘要 On the substrate (1) is formed an epitaxial region (3) of first conductivity, comprising the first trough (2). A low dopant density second trough (4) of second conductivity is so formed in the epitaxial region that it reaches the first trough in an appropriate region. The first trough is in two parts with intermediate spacing, and so is the second trough of such design as to extend to an outer, peripheral section of the first through parts in the second trough may be incorporated a switching element.
申请公布号 DE19818024(A1) 申请公布日期 1999.04.01
申请号 DE19981018024 申请日期 1998.04.22
申请人 MITSUBISHI DENKI K.K., TOKIO/TOKYO, JP 发明人 TERASHIMA, TOMOHIDE, TOKIO/TOKYO, JP;SHIMIZU, KAZUHIRO, TOKIO/TOKYO, JP
分类号 H01L21/761;H01L21/8222;H01L21/8249;H01L27/06;H01L29/732;(IPC1-7):H01L21/761;H01L29/78 主分类号 H01L21/761
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