METHOD OF FORMING A FILM AT LOW TEMPERATURE FOR A SEMICONDUCTOR DEVICE,申请号KR19950011278-传众专利搜索

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发明名称	METHOD OF FORMING A FILM AT LOW TEMPERATURE FOR A SEMICONDUCTOR DEVICE
摘要
申请公布号	KR0175430(B1)	申请公布日期	1999.04.01
申请号	KR19950011278	申请日期	1995.05.09
申请人	MATSUSHITA ELECTRIC IND. CO.,LTD	发明人	MIZUNO, BUNJI;OKADA, KENJI;NAKAYAMA, ICHIROU
分类号	C23C16/48;H01L21/205;H01L21/285;H01L21/316;(IPC1-7):H01L21/31	主分类号	C23C16/48
代理机构		代理人
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