| 摘要 |
<p>The Y-axis direction position of the stage (WST) is directly measured by an interferometer (76Y). The X-axis direction position of the stage (WST) is determined by performing calculation based on the values measured by first and third interferometers (76X1, 76X2) for measuring the position of the stage (WST) in different directions. First to third reflecting surfaces (60a, 60b, 60c) are arranged in a triangle to allow use of a triangle stage (WST), which reduces the size and weight of the stage compared with a conventional rectangular stage. When transferring a mask pattern onto a plurality of shot areas (S1, S2) on the substrate sequentially, the throughput can be improved by performing the prescan of the shot area (S21) and the stepping operation of the shot area (S2) parallelly.</p> |
