发明名称 Apparatus and methods for assessing the resistance of a material to damage from exposure to high-intensity polarized laser light
摘要 <p>A subject apparatus comprises a laser source (11), a light-intensity adjustment (14), a polarizer (13), and a sensor (19). The laser source (11) emits a beam of laser light toward a sample (18), the light having a characteristic that generates a measurable response in the sample (18) whenever the sample receives an amount of the laser light. The light-intensity adjustment varies the intensity of the laser light directed to the sample. The polarizer polarizes the laser light directed to the sample. The sensor detects the response in the sample. The polarizer comprises first and second plates transmissive to the laser light. Each plate is oriented at an angle of incline relative to a plane perpendicular to the laser beam, the angle of incline for the first plate being opposite to the angle of incline for the second plate. At least one of the plates comprises a surficial film coating that transmits one of the components of the polarized light and reflects the other component. &lt;IMAGE&gt;</p>
申请公布号 EP0905505(A1) 申请公布日期 1999.03.31
申请号 EP19980117995 申请日期 1998.09.23
申请人 NIKON CORPORATION 发明人 OSHIKAWA, SATORU
分类号 G01M11/00;G01N17/00;(IPC1-7):G01N17/00 主分类号 G01M11/00
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