A semiconductor material has a surface iron and/or chromium content of less than 6.66 x 10<-11> g/cm<2>. Independent claims are also included for: (1) production of the above semiconductor material, in which the material is pre-washed with an oxidizing cleaning solution, washed with a cleaning solution containing nitric and hydrofluoric acids and made hydrophilic by washing with an oxidizing cleaning liquid; and (2) a cleaning apparatus, in which a container with openings is raised and lowered so that cleaning liquid is emptied completely from the container.
