发明名称 Plasmaless dry contact cleaning method using interhalogen compounds
摘要 A method of removing an oxide layer from an article. The article is located in a reaction chamber. An interhalogen compound reactive with the oxide layer is introduced into the reaction chamber. The interhalogen compound forms volatile by-product gases upon reaction with the oxide layer. For compounds that form volatile chlorides, bromides or iodides, a reducing gas, such as for example hydrogen, ammonia, amines, phosphine, silanes, and higher silanes, may optionally be added simultaneously with the interhalogen to form a volatile by-product. Unreacted interhalogen compound and volatile by-product gases are removed from the reaction chamber. In one embodiment, the temperature in the reaction chamber may be elevated prior to or after introducing the interhalogen compound. In another embodiment, a metal layer is deposited in-situ on a portion of the article within the reaction chamber.
申请公布号 US5888906(A) 申请公布日期 1999.03.30
申请号 US19960714651 申请日期 1996.09.16
申请人 MICRON TECHNOLOGY, INC. 发明人 SANDHU, GURTEJ S.;WESTMORELAND, DONALD L.
分类号 H01L21/285;H01L21/311;(IPC1-7):H01L21/302 主分类号 H01L21/285
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