发明名称 Method for microfabricating diamond
摘要 A method for microfabricating diamond includes the steps of: forming a resist layer composed of a ladder silicone spin-on glass material on the surface of diamond; performing lithography, in which the resist layer is irradiated with an electron beam or an ion beam in a given pattern; developing the resist layer to form the given pattern; and etching diamond by an ECR plasma etching method or a high-frequency plasma etching method.
申请公布号 US5888846(A) 申请公布日期 1999.03.30
申请号 US19980086561 申请日期 1998.05.29
申请人 KABUSHIKI KAISHA KOBE SEIKO SHO 发明人 MIYATA, KOICHI;KOBASHI, KOJI;SUZUKI, KOHEI;NOZAWA, TOSHIHISA
分类号 C30B29/04;B81C1/00;C30B33/08;H01L21/04;(IPC1-7):H01L21/00;H01L21/335;H01L21/84 主分类号 C30B29/04
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