发明名称 |
Method for microfabricating diamond |
摘要 |
A method for microfabricating diamond includes the steps of: forming a resist layer composed of a ladder silicone spin-on glass material on the surface of diamond; performing lithography, in which the resist layer is irradiated with an electron beam or an ion beam in a given pattern; developing the resist layer to form the given pattern; and etching diamond by an ECR plasma etching method or a high-frequency plasma etching method.
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申请公布号 |
US5888846(A) |
申请公布日期 |
1999.03.30 |
申请号 |
US19980086561 |
申请日期 |
1998.05.29 |
申请人 |
KABUSHIKI KAISHA KOBE SEIKO SHO |
发明人 |
MIYATA, KOICHI;KOBASHI, KOJI;SUZUKI, KOHEI;NOZAWA, TOSHIHISA |
分类号 |
C30B29/04;B81C1/00;C30B33/08;H01L21/04;(IPC1-7):H01L21/00;H01L21/335;H01L21/84 |
主分类号 |
C30B29/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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