DATA PROCESSING METHOD FOR PHOTO MASK FORMATION, AND PATTERN DRAWING EQUIPMENT FOR PHOTO MASK FORMATION

摘要

PROBLEM TO BE SOLVED: To enable easy and sure changing drawing parameters for forming a photo mask for pattern transfer. SOLUTION: The respective drawing parameters for forming a photo mask for pattern transfer are distinguished by using key words (S0). A file of pattern drawing parameters for forming a photo mask is retrieved with the key words by using a interactive mode (S1-S3). When the corresponding drawing parameter is detected (S4), an operator changes the corresponding part of the drawing parameter by using the interactive mode (S5). The changed drawing parameter is stored in a storing means.