发明名称 NITRIDE SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a highly reliable nitride semiconductor device having enhanced emission intensity in which short circuit does not occur even after long term use under high temperature high humidity conditions. SOLUTION: The nitride semiconductor device comprises a substrate 11, an n-type layer 12 and a p-type layer 13 formed sequentially on the substrate 11, a p-type electrode 23 provided on the p-type 13, a first recess 301 reaching the n-type layer 12 from the p-type layer 13 side, an n-electrode 14 provided on the n-type layer 12 exposed to the first recess 301, and a second recess 302 reaching the substrate 11 from the p-type layer 13 side. The surface 304 of the substrate exposed to the second recess 302 is located lower than the interface between the n-type layer 12 and the substrate 11 and an insulation film 24 is formed continuously from the p-type electrode 23 and the n-electrode 14 to the second recess 302 except the bonding face of the p-type electrode 23 and the n-electrode 14.
申请公布号 JPH1187771(A) 申请公布日期 1999.03.30
申请号 JP19970246665 申请日期 1997.09.11
申请人 NICHIA CHEM IND LTD 发明人 TOYODA TATSUNORI;SHONO HIROBUMI;TANAKA HISANORI;SAKAKI ATSUSHI
分类号 H01L33/10;H01L33/22;H01L33/32;H01L33/40;H01L33/44;H01L33/62;H01S5/00;H01S5/22;H01S5/323 主分类号 H01L33/10
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