| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a semiconductor device having an alignment mark, which reduces random reflection and can be detected easily and precisely by suppressing the growth of grains during heat treatment, and a method of manufacture thereof. SOLUTION: An alignment mark 12 has a set of two horizontal strips 12a lying in parallel to each other with a predetermined spacing d, and a set of two vertical strips 12b lying in parallel to each other with the same spacing d. The strips are made of an aluminum alloy film formed on a silicon oxide film 11 on a substrate 10, wherein the width W of each of the stripes 12a and 12b is made smaller than 5μm, or the thickness t of the each is made smaller than 0.3μm. By making the width W or the thickness t of the each strip smaller than the specified value, the growth of the grains in the strips during heat treatment is suppressed, and their random reflection coefficient is reduced. As a result of the prevention of the random reflection the detection of the alignment mark facilitated and enhances the alignenment accuracy, resulting in the prevention of the occurrence of failure of the products.</p> |
