发明名称 |
Process for removing residue from screening masks with alkaline solution |
摘要 |
This invention relates to the use of water-based cleaning solutions and their use as environmentally safe replacements of chlorinated hydrocarbon solvents to remove metal-polymer composite paste residue from screening masks and ancillary equipment, such as, used for screening a conductive metal pattern on a ceramic green sheet in the manufacture of multi-layer ceramic products.
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申请公布号 |
US5888308(A) |
申请公布日期 |
1999.03.30 |
申请号 |
US19970808926 |
申请日期 |
1997.02.28 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
SACHDEV, KRISHNA G.;KNICKERBOCKER, JOHN U.;POMERANTZ, GLENN A.;TRIPP, BRUCE E. |
分类号 |
B41F35/00;B41N3/06;C04B41/53;C11D1/22;C11D1/72;C11D1/74;C11D1/831;C11D3/02;C11D3/08;C11D3/10;C11D7/06;C11D11/00;H05K3/12;H05K3/26;(IPC1-7):B08B3/12;C23G1/14 |
主分类号 |
B41F35/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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