发明名称 Process for removing residue from screening masks with alkaline solution
摘要 This invention relates to the use of water-based cleaning solutions and their use as environmentally safe replacements of chlorinated hydrocarbon solvents to remove metal-polymer composite paste residue from screening masks and ancillary equipment, such as, used for screening a conductive metal pattern on a ceramic green sheet in the manufacture of multi-layer ceramic products.
申请公布号 US5888308(A) 申请公布日期 1999.03.30
申请号 US19970808926 申请日期 1997.02.28
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 SACHDEV, KRISHNA G.;KNICKERBOCKER, JOHN U.;POMERANTZ, GLENN A.;TRIPP, BRUCE E.
分类号 B41F35/00;B41N3/06;C04B41/53;C11D1/22;C11D1/72;C11D1/74;C11D1/831;C11D3/02;C11D3/08;C11D3/10;C11D7/06;C11D11/00;H05K3/12;H05K3/26;(IPC1-7):B08B3/12;C23G1/14 主分类号 B41F35/00
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