| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for treating substrates, which can precisely control the substrate temp. and improve the quality of the treated substrates. SOLUTION: A substrate carrying robot 6 has a hollow exhaust housing 25 between upper and lower plates 25a, 25b of this housing with may vent holes VO disposed at an upper and lower plates 25a, 25b of the housing and an exhaust pipe, which is disposed at its side face and connected to an exhaust line in facilities to exhaust the atmosphere near an upper and lower stage arms 10, 11 out from the exhaust line via the vent holes VO and a pipe 25c. Thus the hot atmosphere heated either high temp. carrying arm 10, 11 and a hot substrate held therewith will not reach at the other normal-temp. arm 10, 11 or the normal-temp. substrate held therewith, thereby precisely controlling the substrate temp. |
