摘要 |
A process for removing or reducing the directionality or anisotropy of a surface and for making the surface specular on a substrate material consisting of aluminium or an aluminium alloy, by (a) chemically etching the substrate material, (b) subjecting the etched substrate material substrate material to electrochemical polishing by using a solution, and (c) subjecting the substrate material to additional chemical etching and electrochemical polishing directly after step (b), wherein the surface of the substrate material is not exposed to air between the etching and the electrochemical polishing. |