| 摘要 |
PROBLEM TO BE SOLVED: To prevent the occurrence of a side-etched state and to produce a color filter substrate excellent in surface smoothness. SOLUTION: A soln. contg. a basic compd., an anionic low molecular surfactant, an anionic high molecular surfactant and water is used as an alkali developer for a photosensitive resin compsn. Since the occurrence of a side-etched state in a colored layer 2 is suppressed while shortening development time and diminishing residue in the unexposed part, the objective color filter substrate excellent in surface smoothness is obtd. |
