| 摘要 |
<p>PROBLEM TO BE SOLVED: To surely and rapidly correct phase quantity excess and shortage defective parts without contact, to prevent contamination and to improve performance and productivity. SOLUTION: In the correction to the phase quantity excess defective parts, the phase quantity excess defective part specified on a shifter material deposition type mask substrate 25 on a substratepositioning stage 23 is irradiated with UV rays from a condenser lens of a large numerical aperture of a condensing optical system 22 through a beam shaping optical system 21 and is annihilated by evaporation (abrasion). In the correction to the phase quantity shortage defective part, the phase quantity shortage defective part is irradiated with the UV rays having a prescribed range (length) in the depth direction to the shift material deposition type mask substrate 25 from the condenser lens of the small numerical aperture of the condensing optical system 22. Compaction is induced by this energy density and the optical distance (physical distance×refractive index) of the phase quantity shortage defective part is extended, by which a phase difference is substantially decreased and the correction thereof is executed.</p> |
