| 摘要 |
PROBLEM TO BE SOLVED: To obtain a pattern having high resolution, high sensitivity, excellent adhesion property to a substrate, coating property and storage stability without causing environmental pollution by forming a photoset pattern in a process including a step of applying a photosensitive resin compsn. which contains a photosensitive resin having specified structural unit on a substrate to form a photosensitive resin compsn. coating film. SOLUTION: In this pattern forming method, a photosensitive resin compsn. which contains a photosensitive resin having a structural unit expressed by formula I is applied on a substrate to form a photosensitive compsn. coating film. The photosensitive compsn. is exposed to light according to a desired pattern. and the exposed photosensitive compsn. coating film according to the pattern is developed with water or a water-based developer to form a photoset pattern. In formula I, n is 1, 2, or 3, and Ar is selected from formula II. In formula II, X is lithium, sodium, potassium, ammonium, monoalkylammonium, dialkylammonium, trialkylammonium, etc. |
