| 摘要 |
<p>The invention relates to a method for producing plasma by microwave irradiation, wherein a process gas is conducted into a container and a plasma is ignited by means of microwave irradiation. According to the invention, the injected microwave radiation is pulsed. This enables the same process result to be obtained at lower effective microwave output so that the process temperature can be scaled down. The process rate can also be increased at effectively the same injection output, thereby reducing process time and increasing charge quantities to a considerable degree.</p> |
