发明名称 INSULATED GATE POWER SEMICONDUCTOR DEVICE HAVING A SEMI-INSULATING SEMICONDUCTOR SUBSTRATE
摘要 An insulated gate power semiconductor switching device (11) such as a lateral DMOSFET or a lateral IGBT disposed on a semi-insulating substrate (12). In particular, the substrate may consist of semi-insulating silicon carbide, eg. vanadium-doped SiC. Accordingly, high voltage lateral field-effect can be manufactured using readily available silicon carbide wafers having epilayers of about 10-15 micrometers.
申请公布号 WO9859374(A3) 申请公布日期 1999.03.25
申请号 WO1998US13003 申请日期 1998.06.23
申请人 COOPER, JAMES, ALBERT, JR.;MELLOCH, MICHAEL, R.;SHENOY, JAYARAMA;SPITZ, JAN 发明人 COOPER, JAMES, ALBERT, JR.;MELLOCH, MICHAEL, R.;SHENOY, JAYARAMA;SPITZ, JAN
分类号 H01L29/167;H01L21/76;H01L29/10;H01L29/24;H01L29/739;H01L29/78 主分类号 H01L29/167
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