| 摘要 |
A photolithography method includes the steps of (a) forming a film by coating a film forming composition having a bonding resin and a film forming material on a substrate and drying the resultant; (b) selectively coating a photosensitive composition comprising a photosensitizer only on a predetermined portion of the film, according to a desired film pattern; (c) exposing the resultant obtained in step (b); and (d) forming a desired film pattern by devloping the exposed resultant. Therefore, a film pattern having excellent film characteristics can be manufactured easily and efficiently. The photolithography method can be applied to any product which requires the formation of a film pattern, for example, a VFD, CRT, FED or PDP.
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