摘要 |
A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask comprises the imagewise exposure of a radiation sensitive diazide-containing coating (conventionally considered as a UV sensitive material), to non-UV radiation, such as direct heat radiation or infra-red radiation. A positive of the exposed image is revealed on development. Additionally, it has been found that a flood exposure to UV radiation after the imagewise exposure to the non-UV radiation means that a negative of the exposed image is revealed, on development. |
申请人 |
KODAK POLYCHROME GRAPHICS LLC;MCCULLOUGH, CHRISTOPHER, DAVID;RAY, KEVIN, BARRY;MONK, ALAN, STANLEY, VICTOR;BAYES, STUART;KITSON, ANTHONY, PAUL |
发明人 |
MCCULLOUGH, CHRISTOPHER, DAVID;RAY, KEVIN, BARRY;MONK, ALAN, STANLEY, VICTOR;BAYES, STUART;KITSON, ANTHONY, PAUL |