Treatment mechanism with liquid reservoir for cleaning semiconductor wafers, or LCD substrates

摘要

A clean water supply source (31) is coupled to the treatment section (30) by a feed pipe (33), while a chemical liquid is stored in a separate container (34). A chemical liquid feed pipe (36), with a switch (35), connects the clean water feed pipe and the container. In the feed pipe, there is a feeder (37) in the form of a positive displacement pump, another treatment section serves for drying the treated object (W) by a suitable gas from a supply source of a drying gas carrier gas via a feed pipe.