| 摘要 |
<p>A wafer cleaning tank (30) including a tank body (32) containing therein a cleaning solution, and wafer supporting device (34) for substantially vertically supporting at least one wafer (W) in the tank body, wherein the wafer supporting device (34) includes a pair of confronting fixed wafer support members (36a, 36b) disposed in the tank body with a predetermined space therebetween and each having at least one side wafer-supporting portion (40), and a movable wafer support member (38) vertically movably disposed centrally between the fixed wafer support members at a level below the fixed wafer support members and having at least one central wafer-supporting portion (42) corresponding in position to the position of the side wafer-supporting portion of each of the fixed wafer support members, and wherein the side wafer-supporting portions (40) and the central wafer-supporting portion (42) jointly form a three-point support structure which supports the wafer at three points on the outer edge thereof. The wafer cleaning tank thus constructed is capable of cleaning a plurality of wafers at one time and well adaptable to the cleaning of wafers of different diameters. <IMAGE></p> |
