摘要 |
Disclosed herein is a pattern forming process comprising the steps of coating a substrate with a photosensitive resin composition comprising a polyamic compound having, at each terminal thereof, an actinic ray-sensitive functional group which has substituent groups each having a photopolymerizable carbon-carbon double bond, a photosensitive auxiliary having a photopolymerizable functional group, a photopolymerization initiator, and a solvent to form a film; subjecting the film to pattering exposure; and then developing the thus-exposed film with an alkaline developer or alkaline aqueous solution.
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申请人 |
NIPPON ZEON CO., LTD.;FUJITSU LIMITED |
发明人 |
TANAKA, AKIRA;KOSHIYAMA, MASAMI;SAKAMOTO, KEI;YONEDA, YASUHIRO;YOKOUCHI, KISHIO;MIZUTANI, DAISUKE;ISHIZUKI, YOSHIKATSU |