Photomask case, conveying device, and conveying method

摘要

This mask case is a mask case 210 for accommodating a reticle M formed with a pattern to be transferred to a substrate, in which one outer wall face 210c of the mask case 210 is formed with first and second depressions 211, 211a, 212, and the form of the first depression 211, 211a is one of conical and triangular pyramidal forms, whereas the second depression 212 has a V-groove form.